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Journal papers published in 2025

  • S. -H. Kuk, B. -H. Kim, Y. Park, K. Ko, H. -S. Hwang, B- J. Cho, J. -H. Han, S. -H. Kim*, "Superior QLC Retention Enhancement of a Large Memory Window FEFET Through Gate-Stack Engineering", IEEE Transactions on Electron Devices, accepted (Special issue for the extended paper of International Electron Devices Meeting (IEDM) 2024)

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34141 대전광역시 유성구 대학로 291 한국과학기술원(KAIST) 전기 및 전자공학부 E3-2, 1230호
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